The utility model relates to an etching auxiliary device, which relates to an optical material processing device. Determination of components of sub surface defect depth provided by chemical etching method, can effectively avoid an etching solution concentration auxiliary device is not uniform, the reaction exothermic reaction, generating complex caused by factors such as measurement error. Including bracket, thermostatic pot, micro motor, can be telescopic hanging rod and a basket, a telescopic tube, a sealing cover, a beaker and a heating element; the lower part of the pot temperature which is arranged on the bracket, a miniature motor is arranged on the upper part of the bracket, the upper end of the hanging rod can be telescopic micro motor output shaft, can be telescopic hanging rod end hanging basket the upper end of the telescopic tube, the upper beam connection, the telescopic tube is connected with the sealing cover, the sealing cover seal the mouth of the beaker and hold the beaker, the telescopic hanging rod in the telescopic tube, the basket in the beaker, heating at the bottom of the pot temperature. The bracket is provided with a base, an upright post and a cross beam.
【技术实现步骤摘要】
本技术涉及一种光学材料加工设备,尤其是涉及一种刻蚀辅助装置。
技术介绍
光学材料加工亚表面损伤是指其近表面区域由机械加工过程产生的断裂、变形和污染等内部缺陷。Carr等人提出的抛光亚表面损伤模型将抛光亚表面损伤层自上而下分为两层,分别为抛光再沉积层和塑性变形层(或再分布层),其中,抛光再沉积层由抛光液与试件表面的水解作用产生,该层的成分、致密度及折射系数均与基体存在差别,此外,该层中嵌入了浓度随深度递减的抛光杂质,由于抛光再沉积层的存在使得光学材料抛光过程易于获得超光滑表面;而塑性变形层中包含裂纹、位错和残余应力。作者检测出石英玻璃抛光再沉积层的深度约为lOOnm,而塑性变形层距离表面100 500nm (参见文献:J.W.Carr, E.Fearon, L J.Sununers,et al.Subsurface structure in polished fusedsilica and diamond turned single crystal silicon.Lawrence Livermore NationalLaboratory(LLNL)Report,1999,June:1 12)。在用刻蚀法进行亚表面深度检测时发现蚀刻液浓度和温度以及反应时间对蚀刻速率影响较大,并且化学反应过程的复杂性(反应的吸放热、溶液浓度的分布)使得整个实验过程无法保证反应条件稳定。此外,由于反应过程中会在玻璃表面形成络合物阻碍HF酸与玻璃的反应,因此通过绝对蚀刻速率变化测量亚表面损伤,不能真实反映实际反应过程,存在较大误差。
技术实现思路
本技术的目的在于提供采用化学刻蚀 ...
【技术保护点】
一种刻蚀辅助装置,其特征在于包括支架、恒温锅、微型电机、可升缩挂杆、提篮、伸缩管、密封盖、烧杯和加热件;所述恒温锅设于支架下部,微型电机设于支架上部,可升缩挂杆上端与微型电机输出轴连接,可升缩挂杆下端挂住提篮,伸缩管上端与所述上横梁连接,伸缩管下端与密封盖连接,密封盖封盖住烧杯口并夹持住烧杯,所述可升缩挂杆位于伸缩管中,所述提篮位于烧杯内,加热件位于恒温锅底部。
【技术特征摘要】
1.一种刻蚀辅助装置,其特征在于包括支架、恒温锅、微型电机、可升缩挂杆、提篮、伸缩管、密封盖、烧杯和加热件; 所述恒温锅设于支架下部,微型电机设于支架上部,可升缩挂杆上端与微型电机输出轴连接,可升缩挂杆下端挂住提篮,伸缩管上端与所述上横梁连接,伸缩管下端与密封盖连接,密封盖封盖住烧杯口并夹持住烧杯,所述可升缩挂杆位于伸缩管中,所述提篮位于烧杯内,加热件位于恒温锅底部。2.如权利要求1所述一种刻蚀辅...
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