The etching device of the utility model provides a surface shape of optical elements for high precision repair, including frame, etching head, three-dimensional moving platform and computer, the etching head is mounted on the three-dimensional mobile platform, three-dimensional mobile platform control line is connected with the computer through the etching head by etching liquid container and container place the volatile organic solvent composition, wherein the container is arranged in the etching liquid vessel outside the container around the upper opening, the etching liquid container is arranged on the etching liquid outlet. Because the utility model is adopted to limit the etching area volatile organic liquid, the controllable chemical grinding \effect on optical pollution less, sub surface defects and impurities in the process can effectively avoid polishing materials introduced in traditional processing, can be on a thin substrate at present hard and medium caliber optical elements with high accuracy, surface repair without pollution.
【技术实现步骤摘要】
【技术保护点】
光学元件面形修复的刻蚀装置,其特征在于:包括装架(1)、刻蚀头(2)、三维移动平台(3)和计算机(7),所述刻蚀头(2)安装在三维移动平台(3)上,三维移动平台(3)通过控制线与计算机(7)相连,所述刻蚀头(2)由放置易挥发有机溶剂的容器(9)和刻蚀液容器(10)组成,所述容器(9)设置在刻蚀液容器(10)的外部四周,所述容器(9)上端开口,所述刻蚀液容器(10)上设置有刻蚀液出口(11)。
【技术特征摘要】
【专利技术属性】
技术研发人员:许乔,侯晶,张清华,王健,雷向阳,周礼书,陈宁,
申请(专利权)人:成都精密光学工程研究中心,
类型:实用新型
国别省市:90[中国|成都]
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