The utility model relates to an acid mixing device, which comprises an acid mixing chamber and an overflow chamber connected with the acid mixing chamber. The overflow chamber is arranged at the upper end side of the acid mixing chamber, and an overflow plate fixed at the bottom end of the acid mixing chamber and perpendicular to the bottom end of the overflow chamber is inclined downward from the acid mixing chamber to the overflow chamber, and the overflow chamber is inclined downward from the acid mixing chamber to the overflow chamber. An overflow outlet is formed between the plate and the top of the acid mixing chamber and the overflow chamber; the lower end of the acid mixing chamber is provided with an acid drainage outlet connected with the acid mixing chamber and a cap A matched with the acid drainage outlet; the lower end of the overflow chamber is provided with a detection outlet connected with the overflow chamber and a cap B matched with the detection outlet; and the top end of the acid mixing chamber is provided with an inlet connected with the acid mixing chamber. The acid mixing chamber is provided with at least two guiding columns whose top is located at the outside end of the acid mixing chamber, and the guiding column can move up and down along the acid mixing chamber. The utility model has the advantages that the device can save time, labor intensity is small, and is suitable for taking mixed acid in the same batch.
【技术实现步骤摘要】
一种混酸装置
本技术涉及一种混合装置，特别涉及一种混酸装置。
技术介绍
伴随集成电路制造工艺的不断进步，半导体器件的体积变得越来越小，这导致了非常小的颗粒也变得足以影响半导体器件的制造和性能，所以硅片清洗工艺也变得越来越重要。目前，硅片清洗常见的方法有物理清洗和化学清洗两种，其中，化学清洗是为了除去原子、离子不可见的污染,方法较多,有溶剂萃取、酸洗（硫酸、硝酸、王水、各种混合酸等）和等离子体法等，采用混合酸清洗时，经常需要将几种酸按照一定的体积比进行混合，通常是采用量筒进行量取，但是对于同一批次的混酸混合，这种量取方式费时，且劳动强度大。因此，研发一种能够节省时间、劳动强度小且适用于同批次混酸量取的混酸装置是非常有必要的。
技术实现思路
本技术要解决的技术问题是提供一种能够节省时间、劳动强度小且适用于同批次混酸量取的混酸装置。为解决上述技术问题，本技术的技术方案为：一种混酸装置，其创新点在于：包括一混酸室及与混酸室连通的溢流室，所述溢流室设置在混酸室上端侧部，且混酸室与溢流室之间设有与溢流室底端固定且与溢流室底端垂直的由混酸室向溢流室倾斜向下设置的溢流板，所述由混酸室向溢...
【技术保护点】
1.一种混酸装置，其特征在于：包括一混酸室及与混酸室连通的溢流室，所述溢流室设置在混酸室上端侧部，且混酸室与溢流室之间设有与溢流室底端固定且与溢流室底端垂直的由混酸室向溢流室倾斜向下设置的溢流板，所述由混酸室向溢流室倾斜向下设置的溢流板与混酸室及溢流室的顶端之间形成溢流口；所述混酸室的下端设有与混酸室连通的排酸口，且排酸口上设有与排酸口配合的帽盖A；所述溢流室的下端设有与溢流室连通的检测口，且检测口上设有检测口配合的帽盖B；所述混酸室的顶端设有与混酸室连通的进料口，且所述混酸室内设有至少两个顶端位于混酸室外端的导向柱，所述导向柱可沿混酸室进行上下移动。
【技术特征摘要】
1.一种混酸装置，其特征在于：包括一混酸室及与混酸室连通的溢流室，所述溢流室设置在混酸室上端侧部，且混酸室与溢流室之间设有与溢流室底端固定且与溢流室底端垂直的由混酸室向溢流室倾斜向下设置的溢流板，所述由混酸室向溢流室倾斜向下设置的溢流板与混酸室及溢流室的顶端之间形成溢流口；所述混酸室的下端设有与混酸室连通的排酸口，且排酸口上设有与排酸口配合的帽盖A；所述溢流室的下端设有与溢流室连通的检测口，且检测口上设有...
【专利技术属性】
技术研发人员：山世清，黎弈夆，
申请(专利权)人：江苏晶睿光电科技有限公司，黎弈夆，
类型：新型
国别省市：江苏,32
还没有人留言评论。发表了对其他浏览者有用的留言会获得科技券。