The invention relates to the design of a two-dimensional photonic crystal sensor with elliptical air hole partially etched based on Fano resonant silicon nitride (SiNx) material, belonging to the technical field of photonic crystal sensors. The structure of the sensor is improved on the basis of the traditional elliptical air hole fully etched two-dimensional photonic crystal structure to improve the performance of the sensor. Specifically, the full-penetrating air hole structure of elliptical air hole is adjusted to a part-penetrating structure of partial deep etching. By adjusting the incident direction of the light source from parallel to vertical with the photonic crystal plate, the quality factor and sensitivity are improved. The size of the photonic crystal sensor is flexible and can be adjusted according to actual needs. In addition, the design uses silicon nitride as structural material, which improves the structural strength and reduces the amount of etchant used to avoid pollution. The present invention can be used in the field of refractive index sensing in liquid environment.
【技术实现步骤摘要】
基于Fano谐振的椭圆空气孔部分刻蚀型光子晶体传感器
本专利技术涉及一种基于Fano谐振的椭圆空气孔部分刻蚀型二维光子晶体传感器,其特点是传感性能优良,尺寸大小灵活,属于光子晶体传感器
技术介绍
近年来,为了解决有标签检测中修饰目标分子的高成本以及复杂功能化反应等问题,光子晶体无标签传感器受到了广泛的关注。然而,传统的光子晶体传感器(文献1:YonghaoLiu,ShulingWang,DeyinZhao,WeidongZhou,andYuzeSun,“Highqualityfactorphotoniccrystalfilteratk≈0anditsapplicationforrefractiveindexsensing”,OpticsExpress25(9),10536-10545(2017);文献2:FujunSun,JianZhou,LijunHuang,ZhongyuanFu,ZhaoxiangDing,andHuipingTian,“Designon-chipwidth-modulatedline-defectcavityarraystructureformultiplexingcomplexrefractiveindexsensing”,SensorsandActuatorsA:Physical257,8-14(2017);文献3:JianZhou,LijunHuang,ZhongyuanFu,FujunSun,andHuipingTian,“Multiplexedsimultaneoushighsensitivitysensorsw ...
【技术保护点】
1.提出一种基于Fano谐振的椭圆空气孔部分刻蚀的二维光子晶体传感器结构,其特征在于:该传感器制作材料选择为氮化硅,通过调整椭圆空气孔刻蚀深度,使得光场中心局域在空气孔孔内和附近空间。其中光子晶体板板厚160nm,空气孔的刻蚀深度为板厚的一半,即80nm。此时,在垂直平面波光源的照射下,光子晶体板内将激发出两种模式,分别为类TE模和类TM模。其中类TE模的光场中心局域在空气孔正上下方,类TM模的光场中心局域在光子晶体板的正上下方。
【技术特征摘要】
1.提出一种基于Fano谐振的椭圆空气孔部分刻蚀的二维光子晶体传感器结构,其特征在于:该传感器制作材料选择为氮化硅,通过调整椭圆空气孔刻蚀深度,使得光场中心局域在空气孔孔内和附近空间。其中光子晶体板板厚160nm,空气孔的刻蚀深度为板厚的一半,即80nm。此时,在垂直平面波光源的照射下,光子晶体板内将激发出两种模式,分别为类TE模和类TM模。其中类TE模的光场中心局域在空气孔正上下方,类TM模的光场中心局域在光子晶体板的正上下方。2.根...
【专利技术属性】
技术研发人员:田慧平,王铮,王超,孙富君,肖泽坤,
申请(专利权)人:北京邮电大学,
类型:发明
国别省市:北京,11
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