The invention discloses a reverse arc pressure slope type two-way dam, which relates to the field of water conservancy and Hydropower engineering, and provides a two-way dam capable of reducing water surface backwater height. The second dam includes the dam body, including the upstream dam surface and the top of the dam. The second dam also includes the pressure slope, which is located upstream of the dam body and is integrated with the dam system. The top of the pressure slope is even with the top of the dam. The bottom of the pressure slope rises gradually from the downstream to the upstream, and the bottom of the pressure slope transits smoothly with the upstream dam surface. The bottom is best curved. Longitudinal rolling flow is restricted by the compression slope, which controls the longitudinal rolling flow of plunge pool within a certain height range. It can reduce the backwater height in the plunge pool, reduce the fall height behind the second dam and reduce the scour to the downstream channel. When the bottom of the pressure slope is curved, the direction of the bottom of the pressure slope is basically the same as that of the water flow rolling, which can reduce the reaction of the water flow to the pressure slope; at the same time, it is helpful to further enhance the longitudinal rolling effect of the water flow and improve the energy dissipation rate of the plunge pool.
【技术实现步骤摘要】
反弧压坡型二道坝
本专利技术涉及水利水电工程领域,尤其涉及一种水垫塘二道坝。
技术介绍
在高拱坝泄洪消能中,水垫塘消能是一种常用的消能方式。坝身孔口的高速水流射入水垫塘内,形成纵向旋滚水流,经过水气混掺、紊动剪切和扩散作用进行消能,具有消能率高、适应性强、结构体型简单等优点。随着泄洪水头的增加,射流流速增大,水垫塘底板的冲击动压及临底流速也增大,高速射流对水垫塘的结构稳定性和抗冲磨性能要求较高,有可能对水垫塘造成破坏,因此需要采取工程措施予以解决。为了增强水垫塘的消能效果、降低水垫塘底板的冲击动压,可在水垫塘后部设置一定高度的二道坝,以增加水垫塘内消能水体的深度,使高速射流与水垫塘底板之间存在足够深的水垫层。主流在向水垫塘底板下潜过程中形成纵向旋滚并大量掺气,大部分能量得以消耗,从而增大了消能率、降低了底板的冲击动压、保证了水垫塘的安全运行。目前,设置有常规二道坝的水垫塘已成功应用于许多水电站。常规的二道坝体型如图1所示,是具有上游坝面、坝顶面和下游坝面的下大上小的结构。常规的二道坝主要存在两个问题:1、二道坝前水面壅高明显,二道坝后形成较大跌水,下游河道冲刷问题严重;2、水垫塘需要达到一定的长度才能满足消能要求并减轻二道坝前壅水,导致水垫塘长度增加,工程投资增加。
技术实现思路
本专利技术要解决的技术问题是:提供一种能够降低水面壅高的二道坝。为解决上述问题采用的技术方案是:反弧压坡型二道坝包括坝体,坝体包括上游坝面和坝顶面,二道坝还包括设置于坝体上部的压坡,压坡位于坝体上游方并与坝体制成一体,压坡的顶面与坝顶面平齐,压坡的底面由下游端至上游端高程逐渐升高,压 ...
【技术保护点】
1.反弧压坡型二道坝,包括坝体(1),坝体(1)包括上游坝面(11)和坝顶面(12),其特征在于:包括设置于坝体上部的压坡(2),压坡(2)位于坝体(1)上游方并与坝体(1)制成一体,压坡(2)的顶面与坝顶面(12)平齐,压坡(2)的底面由下游端至上游端高程逐渐升高,压坡(2)的底面与上游坝面(11)平滑过渡。
【技术特征摘要】
1.反弧压坡型二道坝,包括坝体(1),坝体(1)包括上游坝面(11)和坝顶面(12),其特征在于:包括设置于坝体上部的压坡(2),压坡(2)位于坝体(1)上游方并与坝体(1)制成一体,压坡(2)的顶面与坝顶面(12)平齐,压坡(2)的...
【专利技术属性】
技术研发人员:叶茂,李仁鸿,何光宇,
申请(专利权)人:中国电建集团成都勘测设计研究院有限公司,
类型:发明
国别省市:四川,51
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